pH, salt, and solvent sensitive polymer brush micro- and nanopatterns fabricated by electron-beam lithography

TitlepH, salt, and solvent sensitive polymer brush micro- and nanopatterns fabricated by electron-beam lithography
Publication TypeConference Paper
Year of Publication2005
AuthorsM Kaholek, W-K Lee, L Feng, B LaMattina, DJ Dyer, and S Zauscher
Conference NameAbstracts of Papers of the American Chemical Society
Date Published08/2005