|Title||Surface-initiated polymerization on nanopatterns fabricated by electron-beam lithography|
|Publication Type||Journal Article|
|Year of Publication||2004|
|Authors||SJ Ahn, M Kaholek, WK Lee, B LaMattina, TH LaBean, and S Zauscher|
|Journal||Advanced Materials (Deerfield Beach, Fla.)|
|Pagination||2141 - 2145|
A new 'top-down/bottom-up' approach for fabricating patterned polymer-brush arrays on the micrometer and nanometer length scales was reported. It was suggested that patterns with well-defined feature dimensions, shapes, and inter-feature spacings can be easily created over large areas by lift-off electron beam lithography (EBL). The utility of combining lift-off EBL for fabrication of Au patterns and surface-initiated polymerization to form micro- and nanostructures of stimulus-responsive polymer brushes on silicon surfaces was demonstrated. The fabrication approach was found to allow a high level of lateral control in patterning surfaces with complex polymer-brush structures over large surface area.
|Short Title||Advanced Materials (Deerfield Beach, Fla.)|