Surface-initiated polymerization on nanopatterns fabricated by electron-beam lithography

TitleSurface-initiated polymerization on nanopatterns fabricated by electron-beam lithography
Publication TypeJournal Article
Year of Publication2004
AuthorsSJ Ahn, M Kaholek, WK Lee, B LaMattina, TH LaBean, and S Zauscher
JournalAdvanced Materials (Deerfield Beach, Fla.)
Volume16
Issue23-24
Start Page2141
Pagination2141 - 2145
Date Published12/2004
Abstract

A new 'top-down/bottom-up' approach for fabricating patterned polymer-brush arrays on the micrometer and nanometer length scales was reported. It was suggested that patterns with well-defined feature dimensions, shapes, and inter-feature spacings can be easily created over large areas by lift-off electron beam lithography (EBL). The utility of combining lift-off EBL for fabrication of Au patterns and surface-initiated polymerization to form micro- and nanostructures of stimulus-responsive polymer brushes on silicon surfaces was demonstrated. The fabrication approach was found to allow a high level of lateral control in patterning surfaces with complex polymer-brush structures over large surface area.

DOI10.1002/adma.200401055
Short TitleAdvanced Materials (Deerfield Beach, Fla.)